BakerClean pCMP Cleaner for Copper
The new Baker pCMP-800 and pCMP-850 cleaners effectively remove slurry particles and trace metals from substrates after CMP processing. Both products are compatible with copper and low-k dielectrics, as well as aluminum, tungsten and silicon dioxide. The pCMP-800 cleaner is designed for rapid, efficient cleaning in the shorter exposure time of most spray and brush systems. The pCMP-850 cleaner is ideal for gentler cleaning of fragile substrates in spray, brush or longer-exposure bath processes.

For more information contact our Application Engineering group at 1-800-JTBAKER (800-582-2537), extension 9346, outside the US 1-908-859-9346, or micro.mbi@tycohealthcare.com.