Baker Aleg-380 Residue Remover - Mallinckrodt Baker, Inc. - Semiconductor International Technology Library

Mallinckrodt Baker, Inc.

Aleg-380

BAKER ALEG™-380
Stripper and Residue Remover

BAKER ALEG™-380 stripper and residue remover provides effective cleaning of bulk photoresists, heavily cross-linked ash/etch residues, and sidewall polymers. It is very effective on ash residues that are high in titanium content. Its versatility allows one chemistry to be used in traditional semiconductor processes containing aluminum/silicon dioxide layers. BAKER ALEG-380 stripper and residue remover can also be used in back end packaging applications(ip chips/bumps).

CHARACTERISTICS:

Efficient etch/ash residue remover providing results in 5–20 minutes
Designed to provide protection against galvanic corrosion associated with device architecture containing complicated metal stacks
100% water soluble formulation—no intermediate solvent rinse required resulting in decreased total process time and costs
Designed to provide broad process latitude in terms of processing time and temperature
Long bath life—typically greater than 24 hours
Does not contain uoride or hydroxylamine

Untreated	After treatment with BAKER ALEG-380 Residue Remover at 65ºC for 20 min
Untreated	After treatment with BAKER ALEG-380 Residue Remover at 65ºC for 20 min.

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