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Levitronix CMP Users Conference 2007

Levitronix CMP Users Conference 2007
English
"Keynote address: Notable Trends in CMP: Past, Present and Future"
Peter Singer, Semiconductor International Magazine, MICRO Magazine
 3001kB
"Solution Chemistry Effects on Cracking and Damage during CMP"
Reinhold H. Dauskardt, Dpt. of Materials Science and Engineering, Stanford University
 808kB
"Controlling CMP related defects via slurry and Post CMP chemistry designs"
Deepak Mahulikar, Planar Solutions LLC, A Fujifilm Wacker JV
 1030kB
"Surface mediated particle-particle aggregation during CMP slurry delivery and handling."
Yuzhuo Li, Clarkson University
 1205kB
"Field Evaluation of High Pressure MagLev Pump in CMP Slurry Recirculation"
David Gerken, BOC Edwards
 469kB
"Pump Induced Slurry Stress Effects During CMP of Metals and Dielectrics"
Rajiv Singh, Particle Engineering Research Center, U. of Florida
 1330kB
"Effect of pump type on the health of various CMP slurries"
Mark Litchy, CT Associates, Inc.
 310kB
"Practical Application of Bulk Slurry Metrology"
Brian Orzechowski, Celerity
 416kB
"Investigation of Valve Effects on Wafer Defectivity using an Oxide Slurry"
Budge Johl and Hethel Porter
 558kB
"Investigations of Nanoparticle Abrasive Retention in Polyurethane CMP Pads post- Cu CMP"
Christopher L. Borst, Iftikhar Ul-hasan, Robert E. Geer
 2326kB
"Post CMP Defects; Their Origin and Removal"
Jin-Goo Park, Div. of Materials and Chemical Engineering Hanyang University, Korea
 3184kB
"Stabilization of pH in Oxide Slurry"
Bob Small, Silco
 130kB
"Efficient Flow Control and Filtration in CMP Slurry Distribution"
Rakesh Singh, Entegris
 182kB

Levitronix CMP Users Conference 2006

Levitronix CMP Users Conference 2005
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