Microelectronic Polymers

  • Over 160 products
  • Dual Damascene Patterning Materials — DUO™248 and DUO™193FS
  • Multilayer Patterning Materials — UVAS
  • Low-k Enablers — Toughening Agent™ Restoration Material
  • Organic Sacrificial Fill Materials — ACCUFLO®
  • Spin-on Glass — ACCUGLASS®
  • Spin-on Dopants

 

Honeywell Toughening Agent material replenishes lost carbon to restore ILD film performance, and can improve yield and reliability.

0.35μm gaps filled using T-12B from Honeywell’s ACCUGLASS series of Spin-on c

Complete fill and planarization of 8μm deep trench features with ACCUFLO T-27

 

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