365nm (i-Line) Wavelength ARC® Products

The 365nm product line of anti-reflective coatings aids the manufacturer in extending the usability of capital equipment by reducing critical dimension.

All 365nm ARC products are PFOS Free, for your health and the safety of the environment.

ARC® i-CON

ARC i-CON is a highly conformal product designed to address issues of coverage and over-etch. It offers a 30% faster etch rate than most advanced i-line photoresists. This series delivers exceptional optical properties through the control of substrate reflectivity which improves CD resolution. At 0.35µm features, the series gives excellent profiles, and has demonstrated feature sizes of 0.25µm with PFI-88.

XHRiC

XHRiC is a highly robust product line specifically designed for advanced i-line dry patterning processes. This optical design with an n-value of 1.84 and a k-value of 0.34 gives excellent absorbance. These products have been employed in poly, gate and metalization levels for 0.30-0.35µm design rule devices. With continuous improvements in lithography technologies 0.25µm feature sizes have been resolved.

WiDE®-B

WiDE-B is specifically designed for wet patterning, which eliminates the need for a substrate adhesion promoter and separate BARC etch. The extended bake latitude and advanced optical characteristics allow the wet-patterning process to achieve 0.35-0.40µm patterns. WiDE is especially useful as a platform for a separation layer that serves as a lift-off application in devices such as surface acoustic wave guides (SAWs).

Optical Properties of the 365nm ARC® Product Line

Photoresist Compatibilities of the 365nm ARC® Product Line

Brewer Science 365nm ARC® products are compatible with all commercialized photoresist used in manufacturing.

Would you like more information about 365nm ARC® products? Click here to fill out an inquiry form or call 573.364.0300 (US) to talk directly to a technical representative.