193nm Wavelength ARC® Products

The 193nm reduced feature sizes challenge is being met with our newest line of anti-reflective coatings, designed to meet the emerging needs of the 193nm photo process.

All 193nm ARC® products are PFOS Free, for your health and the safety of the environment.

ARC®160

ARC®160 - Avoid unscheduled maintenance of your coat/bake module by reducing out-gassing during BARC bake by making ARC®160 your fast-etch process of record.

ARC®93

ARC®93 combines the latest in technology to offer the ArF photolithographer a fast etching BARC with broad photoresist compatibility and low outgassing during bake.  This material is designed for gate, contact and via fill applications.

ARC®82A

ARC®82A is a leading edge 193nm anti-reflective coating designed for improved depth of focus with advanced ArF photoresist. This 2nd minimum BARC is compatible with Fuji Film, JSR, Sumitomo, and TOK photoresist.

ARC®66

ARC®66 is Fuji Film, JSR and TOK photoresist compatible. Designed for use on hard-mask processes.

ARC®29A

ARC®29A is a leading anti-reflective coating for 193nm photolithography. This 2nd minimum material is compatible with a broad range of ArF photoresist. It is available in formulations for 200 & 300mm process.

Optical Properties of the 193nm ARC® Product Line

Photoresist Compatibilities of the 193nm ARC Product Line

Would you like more information about 193nm ARC® products? Click here to fill out an inquiry form or call 573.364.0300 (US) to talk directly to a technical representative.