How do I meet various technology node requirements without significant changes to my low-k process?

Extending existing low-k processes to next generation technology nodes is a challenge faced by many of our customers. To meet this need, Air Products offers PDEMSTM ILD Precursor, an organosilicate glass for ultralow dielectric constant films for intermetal dielectric applications.

With little modification, PDEMS is able to meet target k requirements of
k = 2.7 to k ≤ 2.0 and extend the base product to multiple technology nodes, including 65 nm through 22 nm, while utilizing existing PECVD equipment and Air Products' complimentary product offerings.

To maximize productivity and speed the development of new systems, Air Products offers a comprehensive low-k package, including high-purity electronic specialty gases, its Schumacher low-k chemical product line, delivery equipment and MEGASYS® onsite management services.

For more information on Air Products' low-k offerings, visit us at www.airproducts.com/lok or call 800-654-4567 or 610-706-4730. 

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Air Products can help troubleshoot your purity, pressure and flowrate through a diagnostic audit that includes a gas analysis and piping des schedule, call 800-654-4567.