What delivery challenges do I face when using the high-k precursors, such as TEMAZ, for depositing hafnium and zirconium-based high-k materials? As these precursors are both thermal and moisture intolerant, awareness of temperature limitations and moisture sensitivity is vital. In addition, the packaging, equipment, and inert gases that are used in the process need to be pristine - purity of these precursors is critical to the deposition processes. Air Products has worked for almost a decade in collaboration with our leading customers and major equipment manufacturers to ensure that our high-k precursor offerings and delivery solutions are production-ready. Our CHEMGUARD® 500 fabwide delivery systems, comprehensive thermal stability studies on existing and novel precursors, and knowledge of the process dryness requirements will help you with your process integration. More importantly, our experience, proven reliability and thorough understanding of your challenges will make using these precursors a lot less stressful. Count on us to help you through. For more information on Air Products high-k precursor offerings, visit our website at www.airproducts.com/highk. | 
