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TWINSCAN™Since its introduction in 2000, ASML’s TWINSCAN lithography platform has rapidly established itself as the de facto standard for 300-mm manufacturing.
 The TWINSCAN platform’s unique dual-stage design started a revolution when it was launched seven years ago. Designed to deliver maximum productivity, TWINSCAN technology allows for non-stop parallel processing: measuring one wafer while imaging another.
The TWINSCAN platform’s continuing success is due to its flexible, modular design. You can tailor and upgrade your TWINSCAN tool as needed, adding productivity and performance enhancements to meet changing process requirements.
The current TWINSCAN portfolio covers the entire advanced manufacturing spectrum down to 40 nm. At each technology step you’ll find the right tool for the right job at the right value. At the top of that spectrum is the latest addition to the TWINSCAN family, the XT:1900Gi with HydroLith immersion technology. This immersion tool is the industry’s first imaging system to offer a hyper NA of 1.35 for real-world, high-volume manufacturing. Hyper NA provides unrivalled depth of focus and resolution for manufacturing at smaller nodes than ever before.
The XT:1900Gi takes full advantage of the TWINSCAN dual-stage design, measuring the wafer on a dry stage and exposing it wet. This allows you to gain the benefits of immersion lithography while maintaining the TWINSCAN platform’s renowned measurement accuracy. The XT:1900Gi also delivers industry-leading productivity with a throughput of greater than 131 wafers per hour.
But TWINSCAN innovation isn’t limited to ArF immersion technology. Moving through the technology spectrum from ArFi to i-Line, the TWINSCAN platform offers ultra-high productivity KrF scanners that provide cost-effective solutions for mid-critical layers, and i-line scanners that deliver top-of-the-range value and performance.
TWINSCAN innovation results in more good die per day, lower cost of ownership, and ever-increasing returns on your investment.
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